View of memorial core and tapestry from Maryland Avenue, with Lyndon B. Johnson Department of Education Building behind the tapestry. 
Courtesy Gehry Partners/AECOM View of memorial core and tapestry from Maryland Avenue, with Lyndon B. Johnson Department of Education Building behind the tapestry. 

Following a protracted battle with design revisions and family outcry over Frank Gehry, FAIA's proposal for a memorial to Dwight D. Eisenhower—now a joint venture between Gehry Partners and AECOM—the National Capital Planning Commission (NCPC) approved the final site and building plans [PDF] at a meeting held July 9. In the NCPC's recommendation, the commission confirmed that the final memorial design "satisfies NCPC’s adopted site selection design principles" and that the approval "will not have a significant impact on the human environment."

General Eisenhower memorial element.
Courtesy Gehry Partners/AECOM General Eisenhower memorial element.


Concerns over the material used in a tapestry depicting landscape scenery of Abilene, Kan.former president Eisenhower's hometownwere also addressed in the NCPC's decision. "The applicant has demonstrated that the tapestry material and welds will continue to meet the durability criteria enumerated in the Commemorative Works Act," Marcel Acosta, executive director of the NCPC, stated in the recommendation. 

The proposal received preliminary approval from the NCPC in October 2014 before returning to the various other agencies governing the project. ARCHITECT Editor-in-Chief Ned Cramer, Assoc. AIA, summed up the impasse in his October editorial. 

Read the full design submission below. For more images and information on the Dwight D. Eisenhower Memorial, visit ARCHITECT's Project Gallery


Eisenhower Memorial Design Submission for Final Review, July 9, 2015


Final site plan.
Courtesy Gehry Partners/AECOM Final site plan.
Aerial view.
Courtesy Gehry Partners/AECOM Aerial view.
View of memorial core.
Courtesy Gehry Partners/AECOM View of memorial core.

This post has been updated.